hk company search

SODAM I&T CO., LIMITED
(Company Registration No. 0874221)

SODAM I&T CO., LIMITED was established on 08-Dec-2003, CR No. is: 0874221, The company is Dissolved now, The company belongs to Company. As so far this company has running for21years 5months 1weeks 2days .

Company Name:
SODAM I&T CO., LIMITED
Chinese Company Name::
支援高科有限公司
Company Registration No.：
0874221
Date of Incorporation:
2003-12-08
Company Type:
Private company limited by shares
Company Status::
Dissolved
Date of Dissolution:
2008-08-15
Date of Annual Examination::
Dec 08 - Jan 19
Remarks:
Dissolved by Striking Off
Register of Charges::
Unavailable
Name History:
08-DEC-2003
SODAM I&T CO., LIMITED
支援高科有限公司
Updated on
2019-06-22
Popular Companies

C.I.T. CO., LIMITED

Cr No. 0135280
Company Status: Live

C.I.T. CO., LIMITED was incorporated on 1984-04-06.

UK I&T CO., LIMITED

Cr No. 1117159
Company Status: Dissolved

UK I&T CO., LIMITED was incorporated on 2007-03-22.

S.I.T. CO., LIMITED

Cr No. 1142212
Company Status: Live

S.I.T. CO., LIMITED was incorporated on 2007-06-18.

FIRST I.T. CO., LIMITED

Cr No. 1221824
Company Status: Live

FIRST I.T. CO., LIMITED was incorporated on 2008-04-01.

AIMEE (HK) I&T CO., LIMITED

Cr No. 1297012
Company Status: Dissolved

AIMEE (HK) I&T CO., LIMITED was incorporated on 2008-12-29.

DEFU I&T CO., LIMITED

Cr No. 1367216
Company Status: Dissolved

DEFU I&T CO., LIMITED was incorporated on 2009-08-27.

CHINA RUNFAR INTERNATIONAL I&T CO., LIMITED

Cr No. 1495881
Company Status: Dissolved

CHINA RUNFAR INTERNATIONAL I&T CO., LIMITED was incorporated on 2010-08-20.

Market Right I.T. Co. Limited

Cr No. 1598058
Company Status: Dissolved

Market Right I.T. Co. Limited was incorporated on 2011-05-07.

HUA CHENG I&T CO., LIMITED

Cr No. 1879592
Company Status: Live

HUA CHENG I&T CO., LIMITED was incorporated on 2013-03-21.

Advertising
Recently incorporated companies
Incorporated on the same day
2003-12-08
Privacy Statement
Copyright © 2016 - 2025 Hong Kong Company Directory. All Rights Reserved.